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Adding chemically selective subtraction to multi-material 3D additive manufacturing
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradati...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6050325/ https://www.ncbi.nlm.nih.gov/pubmed/30018325 http://dx.doi.org/10.1038/s41467-018-05234-0 |
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author | Gräfe, David Wickberg, Andreas Zieger, Markus Michael Wegener, Martin Blasco, Eva Barner-Kowollik, Christopher |
author_facet | Gräfe, David Wickberg, Andreas Zieger, Markus Michael Wegener, Martin Blasco, Eva Barner-Kowollik, Christopher |
author_sort | Gräfe, David |
collection | PubMed |
description | Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation of 3D printed microstructures under mild conditions. Three bifunctional silane crosslinkers carrying various substitutions on the silicon atom are synthesized. The photoresists are prepared by mixing these silane crosslinkers with pentaerythritol triacrylate and a two-photon photoinitiator. The presence of pentaerythritol triacrylate significantly enhances the direct laser written structures with regard to resolution, while the microstructures remain cleavable. For the targeted cleavage of the fabricated 3D microstructures, simply a methanol solution including inorganic salts is required, highlighting the mild cleavage conditions. Critically, the photoresists can be cleaved selectively, which enables the sequential degradation of direct laser written structures and allows for subtractive manufacturing at the micro- and nanoscale. |
format | Online Article Text |
id | pubmed-6050325 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-60503252018-07-23 Adding chemically selective subtraction to multi-material 3D additive manufacturing Gräfe, David Wickberg, Andreas Zieger, Markus Michael Wegener, Martin Blasco, Eva Barner-Kowollik, Christopher Nat Commun Article Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation of 3D printed microstructures under mild conditions. Three bifunctional silane crosslinkers carrying various substitutions on the silicon atom are synthesized. The photoresists are prepared by mixing these silane crosslinkers with pentaerythritol triacrylate and a two-photon photoinitiator. The presence of pentaerythritol triacrylate significantly enhances the direct laser written structures with regard to resolution, while the microstructures remain cleavable. For the targeted cleavage of the fabricated 3D microstructures, simply a methanol solution including inorganic salts is required, highlighting the mild cleavage conditions. Critically, the photoresists can be cleaved selectively, which enables the sequential degradation of direct laser written structures and allows for subtractive manufacturing at the micro- and nanoscale. Nature Publishing Group UK 2018-07-17 /pmc/articles/PMC6050325/ /pubmed/30018325 http://dx.doi.org/10.1038/s41467-018-05234-0 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Gräfe, David Wickberg, Andreas Zieger, Markus Michael Wegener, Martin Blasco, Eva Barner-Kowollik, Christopher Adding chemically selective subtraction to multi-material 3D additive manufacturing |
title | Adding chemically selective subtraction to multi-material 3D additive manufacturing |
title_full | Adding chemically selective subtraction to multi-material 3D additive manufacturing |
title_fullStr | Adding chemically selective subtraction to multi-material 3D additive manufacturing |
title_full_unstemmed | Adding chemically selective subtraction to multi-material 3D additive manufacturing |
title_short | Adding chemically selective subtraction to multi-material 3D additive manufacturing |
title_sort | adding chemically selective subtraction to multi-material 3d additive manufacturing |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6050325/ https://www.ncbi.nlm.nih.gov/pubmed/30018325 http://dx.doi.org/10.1038/s41467-018-05234-0 |
work_keys_str_mv | AT grafedavid addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT wickbergandreas addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT ziegermarkusmichael addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT wegenermartin addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT blascoeva addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT barnerkowollikchristopher addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing |