Lithography for robust and editable atomic-scale silicon devices and memories

At the atomic scale, there has always been a trade-off between the ease of fabrication of structures and their thermal stability. Complex structures that are created effortlessly often disorder above cryogenic conditions. Conversely, systems with high thermal stability do not generally permit the sa...

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Detalles Bibliográficos
Autores principales: Achal, Roshan, Rashidi, Mohammad, Croshaw, Jeremiah, Churchill, David, Taucer, Marco, Huff, Taleana, Cloutier, Martin, Pitters, Jason, Wolkow, Robert A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6056515/
https://www.ncbi.nlm.nih.gov/pubmed/30038236
http://dx.doi.org/10.1038/s41467-018-05171-y

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6056515/
https://www.ncbi.nlm.nih.gov/pubmed/30038236
http://dx.doi.org/10.1038/s41467-018-05171-y

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