High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular...

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Detalles Bibliográficos
Autores principales: Keskinbora, Kahraman, Sanli, Umut Tunca, Baluktsian, Margarita, Grévent, Corinne, Weigand, Markus, Schütz, Gisela
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2018
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6071703/
https://www.ncbi.nlm.nih.gov/pubmed/30116695
http://dx.doi.org/10.3762/bjnano.9.194

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6071703/
https://www.ncbi.nlm.nih.gov/pubmed/30116695
http://dx.doi.org/10.3762/bjnano.9.194

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