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High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography
Fresnel zone plates (FZP) are diffractive photonic devices used for high-resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6071703/ https://www.ncbi.nlm.nih.gov/pubmed/30116695 http://dx.doi.org/10.3762/bjnano.9.194 |