Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist

Thick SU-8 photoresist has been a popular photoresist material to fabricate various mechanical, biological, and chemical devices for many years. The accuracy and precision of the ultraviolet (UV) lithography process of thick SU-8 depend on key parameters in the set-up, the material properties of the...

Descripción completa

Detalles Bibliográficos
Autores principales: Zhou, Zai-Fa, Huang, Qing-An
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6082283/
https://www.ncbi.nlm.nih.gov/pubmed/30424274
http://dx.doi.org/10.3390/mi9070341

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6082283/
https://www.ncbi.nlm.nih.gov/pubmed/30424274
http://dx.doi.org/10.3390/mi9070341

Ejemplares similares