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Comprehensive Simulations for Ultraviolet Lithography Process of Thick SU-8 Photoresist
Thick SU-8 photoresist has been a popular photoresist material to fabricate various mechanical, biological, and chemical devices for many years. The accuracy and precision of the ultraviolet (UV) lithography process of thick SU-8 depend on key parameters in the set-up, the material properties of the...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2018
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6082283/ https://www.ncbi.nlm.nih.gov/pubmed/30424274 http://dx.doi.org/10.3390/mi9070341 |