Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios

Mixed micro- and nanoscale structures are gaining popularity in various fields due to their rapid advances in patterning. An investigation in stamp resist filling with multiscale cavities via ultraviolet (UV) nanoimprint lithography (UV-NIL) is necessary to improve stamp design. Here, simulations at...

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Detalles Bibliográficos
Autores principales: Yin, Minqi, Sun, Hongwen, Wang, Haibin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6082289/
https://www.ncbi.nlm.nih.gov/pubmed/30424268
http://dx.doi.org/10.3390/mi9070335

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6082289/
https://www.ncbi.nlm.nih.gov/pubmed/30424268
http://dx.doi.org/10.3390/mi9070335

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