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Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity
2D GeSe possesses black phosphorous‐analog‐layered structure and shows excellent environmental stability, as well as highly anisotropic in‐plane properties. Additionally, its high absorption efficiency in the visible range and high charge carrier mobility render it promising for applications in opto...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6096999/ https://www.ncbi.nlm.nih.gov/pubmed/30128256 http://dx.doi.org/10.1002/advs.201800478 |
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author | Zhou, Xing Hu, Xiaozong Jin, Bao Yu, Jing Liu, Kailang Li, Huiqiao Zhai, Tianyou |
author_facet | Zhou, Xing Hu, Xiaozong Jin, Bao Yu, Jing Liu, Kailang Li, Huiqiao Zhai, Tianyou |
author_sort | Zhou, Xing |
collection | PubMed |
description | 2D GeSe possesses black phosphorous‐analog‐layered structure and shows excellent environmental stability, as well as highly anisotropic in‐plane properties. Additionally, its high absorption efficiency in the visible range and high charge carrier mobility render it promising for applications in optoelectronics. However, most reported GeSe‐based photodetectors show frustrating performance especially in photoresponsivity. Herein, a 2D GeSe‐based phototransistor with an ultrahigh photoresponsivity is demonstrated. Its optimized photoresponsivity can be up to ≈1.6 × 10(5) A W(−1). This high responsivity can be attributed to the highly efficient light absorption and the enhanced photoconductive gain due to the existence of trap states. The exfoliated GeSe nanosheet is confirmed to be along the [001] (armchair direction) and [010] (zigzag direction) using transmission electron microscopy and anisotropic Raman characterizations. The angle‐dependent electric and photoresponsive performance is systematically explored. Notably, the GeSe‐based phototransistor shows strong polarization‐dependent photoresponse with a peak/valley ratio of 1.3. Furthermore, the charge carrier mobility along the armchair direction is measured to be 1.85 times larger than that along the zigzag direction. |
format | Online Article Text |
id | pubmed-6096999 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | John Wiley and Sons Inc. |
record_format | MEDLINE/PubMed |
spelling | pubmed-60969992018-08-20 Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity Zhou, Xing Hu, Xiaozong Jin, Bao Yu, Jing Liu, Kailang Li, Huiqiao Zhai, Tianyou Adv Sci (Weinh) Full Papers 2D GeSe possesses black phosphorous‐analog‐layered structure and shows excellent environmental stability, as well as highly anisotropic in‐plane properties. Additionally, its high absorption efficiency in the visible range and high charge carrier mobility render it promising for applications in optoelectronics. However, most reported GeSe‐based photodetectors show frustrating performance especially in photoresponsivity. Herein, a 2D GeSe‐based phototransistor with an ultrahigh photoresponsivity is demonstrated. Its optimized photoresponsivity can be up to ≈1.6 × 10(5) A W(−1). This high responsivity can be attributed to the highly efficient light absorption and the enhanced photoconductive gain due to the existence of trap states. The exfoliated GeSe nanosheet is confirmed to be along the [001] (armchair direction) and [010] (zigzag direction) using transmission electron microscopy and anisotropic Raman characterizations. The angle‐dependent electric and photoresponsive performance is systematically explored. Notably, the GeSe‐based phototransistor shows strong polarization‐dependent photoresponse with a peak/valley ratio of 1.3. Furthermore, the charge carrier mobility along the armchair direction is measured to be 1.85 times larger than that along the zigzag direction. John Wiley and Sons Inc. 2018-06-21 /pmc/articles/PMC6096999/ /pubmed/30128256 http://dx.doi.org/10.1002/advs.201800478 Text en © 2018 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the http://creativecommons.org/licenses/by/4.0/ License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Full Papers Zhou, Xing Hu, Xiaozong Jin, Bao Yu, Jing Liu, Kailang Li, Huiqiao Zhai, Tianyou Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity |
title | Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity |
title_full | Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity |
title_fullStr | Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity |
title_full_unstemmed | Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity |
title_short | Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity |
title_sort | highly anisotropic gese nanosheets for phototransistors with ultrahigh photoresponsivity |
topic | Full Papers |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6096999/ https://www.ncbi.nlm.nih.gov/pubmed/30128256 http://dx.doi.org/10.1002/advs.201800478 |
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