Cargando…
Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
Vanadium dioxide is a material that has a reversible metal-insulator phase change near 68 °C. To grow VO(2 )on a wide variety of substrates, with wafer-scale uniformity and angstrom level control of thickness, the method of atomic-layer deposition was chosen. This ALD process enables high-quality, l...
| Autores principales: | , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MyJove Corporation
2018
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6101349/ https://www.ncbi.nlm.nih.gov/pubmed/29889197 http://dx.doi.org/10.3791/57103 |