Thermal Stability of Hole-Selective Tungsten Oxide: In Situ Transmission Electron Microscopy Study

In this study, the thermal stability of a contact structure featuring hole-selective tungsten oxide (WO(x)) and aluminum deposited onto p-type crystalline silicon (c-Si/WO(x)/Al) was investigated using a combination of transmission line measurements (TLM) and in situ transmission electron microscopy...

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Detalles Bibliográficos
Autores principales: Ali, Haider, Koul, Supriya, Gregory, Geoffrey, Bullock, James, Javey, Ali, Kushima, Akihiro, Davis, Kristopher O.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6107557/
https://www.ncbi.nlm.nih.gov/pubmed/30140019
http://dx.doi.org/10.1038/s41598-018-31053-w

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6107557/
https://www.ncbi.nlm.nih.gov/pubmed/30140019
http://dx.doi.org/10.1038/s41598-018-31053-w

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