Investigations on the Electrochemical Atomic Layer Growth of Bi(2)Se(3) and the Surface Limited Deposition of Bismuth at the Silver Electrode

The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics...

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Detalles Bibliográficos
Autores principales: Giurlani, Walter, Giaccherini, Andrea, Calisi, Nicola, Zangari, Giovanni, Salvietti, Emanuele, Passaponti, Maurizio, Caporali, Stefano, Innocenti, Massimo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6119908/
https://www.ncbi.nlm.nih.gov/pubmed/30110888
http://dx.doi.org/10.3390/ma11081426

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6119908/
https://www.ncbi.nlm.nih.gov/pubmed/30110888
http://dx.doi.org/10.3390/ma11081426

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