Using Oxygen Plasma Pretreatment to Enhance the Properties of F-Doped ZnO Films Prepared on Polyimide Substrates

In this study, a radio frequency magnetron sputtering process was used to deposit F-doped ZnO (FZO) films on polyimide (PI) substrates. The thermal expansion effect of PI substrates induces distortion and bending, causing FZO films to peel and their electrical properties and crystallinity to deterio...

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Detalles Bibliográficos
Autores principales: Chen, Chih-Cheng, Wang, Fang-Hsing, Chang, Sheng-Cheng, Yang, Cheng-Fu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6163806/
https://www.ncbi.nlm.nih.gov/pubmed/30135372
http://dx.doi.org/10.3390/ma11091501

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6163806/
https://www.ncbi.nlm.nih.gov/pubmed/30135372
http://dx.doi.org/10.3390/ma11091501

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