Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection

Application of micro-Raman spectroscopy for the monitoring of quality of high-k (h-k) dielectric protective layer deposition onto the surface of a nanowire (NW) chip has been demonstrated. A NW chip based on silicon-on-insulator (SOI) structures, protected with a layer of high-k dielectric ((h-k)-SO...

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Detalles Bibliográficos
Autores principales: Malsagova, Kristina A., Pleshakova, Tatyana O., Kozlov, Andrey F., Shumov, Ivan D., Ilnitskii, Mikhail A., Miakonkikh, Andrew V., Popov, Vladimir P., Rudenko, Konstantin V., Glukhov, Alexander V., Kupriyanov, Igor N., Ivanova, Nina D., Rogozhin, Alexander E., Archakov, Alexander I., Ivanov, Yuri D.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6164057/
https://www.ncbi.nlm.nih.gov/pubmed/30060476
http://dx.doi.org/10.3390/bios8030072

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6164057/
https://www.ncbi.nlm.nih.gov/pubmed/30060476
http://dx.doi.org/10.3390/bios8030072

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