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Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
Application of micro-Raman spectroscopy for the monitoring of quality of high-k (h-k) dielectric protective layer deposition onto the surface of a nanowire (NW) chip has been demonstrated. A NW chip based on silicon-on-insulator (SOI) structures, protected with a layer of high-k dielectric ((h-k)-SO...
Autores principales: | , , , , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6164057/ https://www.ncbi.nlm.nih.gov/pubmed/30060476 http://dx.doi.org/10.3390/bios8030072 |
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author | Malsagova, Kristina A. Pleshakova, Tatyana O. Kozlov, Andrey F. Shumov, Ivan D. Ilnitskii, Mikhail A. Miakonkikh, Andrew V. Popov, Vladimir P. Rudenko, Konstantin V. Glukhov, Alexander V. Kupriyanov, Igor N. Ivanova, Nina D. Rogozhin, Alexander E. Archakov, Alexander I. Ivanov, Yuri D. |
author_facet | Malsagova, Kristina A. Pleshakova, Tatyana O. Kozlov, Andrey F. Shumov, Ivan D. Ilnitskii, Mikhail A. Miakonkikh, Andrew V. Popov, Vladimir P. Rudenko, Konstantin V. Glukhov, Alexander V. Kupriyanov, Igor N. Ivanova, Nina D. Rogozhin, Alexander E. Archakov, Alexander I. Ivanov, Yuri D. |
author_sort | Malsagova, Kristina A. |
collection | PubMed |
description | Application of micro-Raman spectroscopy for the monitoring of quality of high-k (h-k) dielectric protective layer deposition onto the surface of a nanowire (NW) chip has been demonstrated. A NW chip based on silicon-on-insulator (SOI) structures, protected with a layer of high-k dielectric ((h-k)-SOI-NW chip), has been employed for highly sensitive detection of microRNA (miRNA) associated with oncological diseases. The protective dielectric included a 2-nm-thick Al(2)O(3) surface layer and a 8-nm-thick HfO(2) layer, deposited onto a silicon SOI-NW chip. Such a chip had increased time stability upon operation in solution, as compared with an unprotected SOI-NW chip with native oxide. The (h-k)-SOI-NW biosensor has been employed for the detection of DNA oligonucleotide (oDNA), which is a synthetic analogue of miRNA-21 associated with oncological diseases. To provide biospecificity of the detection, the surface of (h-k)-SOI-NW chip was modified with oligonucleotide probe molecules (oDVA probes) complementary to the sequence of the target biomolecule. Concentration sensitivity of the (h-k)-SOI-NW biosensor at the level of DL~10(−16) M has been demonstrated. |
format | Online Article Text |
id | pubmed-6164057 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-61640572018-10-10 Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection Malsagova, Kristina A. Pleshakova, Tatyana O. Kozlov, Andrey F. Shumov, Ivan D. Ilnitskii, Mikhail A. Miakonkikh, Andrew V. Popov, Vladimir P. Rudenko, Konstantin V. Glukhov, Alexander V. Kupriyanov, Igor N. Ivanova, Nina D. Rogozhin, Alexander E. Archakov, Alexander I. Ivanov, Yuri D. Biosensors (Basel) Article Application of micro-Raman spectroscopy for the monitoring of quality of high-k (h-k) dielectric protective layer deposition onto the surface of a nanowire (NW) chip has been demonstrated. A NW chip based on silicon-on-insulator (SOI) structures, protected with a layer of high-k dielectric ((h-k)-SOI-NW chip), has been employed for highly sensitive detection of microRNA (miRNA) associated with oncological diseases. The protective dielectric included a 2-nm-thick Al(2)O(3) surface layer and a 8-nm-thick HfO(2) layer, deposited onto a silicon SOI-NW chip. Such a chip had increased time stability upon operation in solution, as compared with an unprotected SOI-NW chip with native oxide. The (h-k)-SOI-NW biosensor has been employed for the detection of DNA oligonucleotide (oDNA), which is a synthetic analogue of miRNA-21 associated with oncological diseases. To provide biospecificity of the detection, the surface of (h-k)-SOI-NW chip was modified with oligonucleotide probe molecules (oDVA probes) complementary to the sequence of the target biomolecule. Concentration sensitivity of the (h-k)-SOI-NW biosensor at the level of DL~10(−16) M has been demonstrated. MDPI 2018-07-27 /pmc/articles/PMC6164057/ /pubmed/30060476 http://dx.doi.org/10.3390/bios8030072 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Malsagova, Kristina A. Pleshakova, Tatyana O. Kozlov, Andrey F. Shumov, Ivan D. Ilnitskii, Mikhail A. Miakonkikh, Andrew V. Popov, Vladimir P. Rudenko, Konstantin V. Glukhov, Alexander V. Kupriyanov, Igor N. Ivanova, Nina D. Rogozhin, Alexander E. Archakov, Alexander I. Ivanov, Yuri D. Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection |
title | Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection |
title_full | Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection |
title_fullStr | Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection |
title_full_unstemmed | Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection |
title_short | Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection |
title_sort | micro-raman spectroscopy for monitoring of deposition quality of high-k stack protective layer onto nanowire fet chips for highly sensitive mirna detection |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6164057/ https://www.ncbi.nlm.nih.gov/pubmed/30060476 http://dx.doi.org/10.3390/bios8030072 |
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