Atomic Layer Deposition of Cobalt Using H(2)-, N(2)-, and NH(3)-Based Plasmas: On the Role of the Co-reactant

[Image: see text] This work investigates the role of the co-reactant for the atomic layer deposition of cobalt (Co) films using cobaltocene (CoCp(2)) as the precursor. Three different processes were compared: an AB process using NH(3) plasma, an AB process using H(2)/N(2) plasma, and an ABC process...

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Detalles Bibliográficos
Autores principales: Vos, Martijn F. J., van Straaten, Gerben, Kessels, W. M. M. Erwin, Mackus, Adriaan J. M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2018
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6174421/
https://www.ncbi.nlm.nih.gov/pubmed/30319724
http://dx.doi.org/10.1021/acs.jpcc.8b06342

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6174421/
https://www.ncbi.nlm.nih.gov/pubmed/30319724
http://dx.doi.org/10.1021/acs.jpcc.8b06342

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