Fabrication of buried nanostructures by atomic layer deposition

We present a method for fabricating buried nanostructures by growing a dielectric cover layer on a corrugated surface profile by atomic layer deposition of TiO(2). Selecting appropriate process parameters, the conformal growth of TiO(2) results in a smooth, nearly flat-top surface of the structure....

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Detalles Bibliográficos
Autores principales: Ali, Rizwan, Saleem, Muhammad Rizwan, Roussey, Matthieu, Turunen, Jari, Honkanen, Seppo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6180036/
https://www.ncbi.nlm.nih.gov/pubmed/30305641
http://dx.doi.org/10.1038/s41598-018-33036-3

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6180036/
https://www.ncbi.nlm.nih.gov/pubmed/30305641
http://dx.doi.org/10.1038/s41598-018-33036-3

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