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Bonding-Based Wafer-Level Vacuum Packaging Using Atomic Hydrogen Pre-Treated Cu Bonding Frames

A novel surface activation technology for Cu-Cu bonding-based wafer-level vacuum packaging using hot-wire-generated atomic hydrogen treatment was developed. Vacuum sealing temperature at 300 °C was achieved by atomic hydrogen pre-treatment for Cu native oxide reduction, while 350 °C was needed by th...

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Detalles Bibliográficos
Autores principales: Tanaka, Koki, Hirano, Hideki, Kumano, Masafumi, Froemel, Joerg, Tanaka, Shuji
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187672/
https://www.ncbi.nlm.nih.gov/pubmed/30424114
http://dx.doi.org/10.3390/mi9040181