Surface Modification of Electroosmotic Silicon Microchannel Using Thermal Dry Oxidation

A simple fabrication method for the surface modification of an electroosmotic silicon microchannel using thermal dry oxidation is presented. The surface modification is done by coating the silicon surface with a silicon dioxide (SiO(2)) layer using a thermal oxidation process. The process aims not o...

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Detalles Bibliográficos
Autores principales: Tuan Yaakub, Tuan Norjihan, Yunas, Jumril, Latif, Rhonira, Hamzah, Azrul Azlan, Razip Wee, Mohd Farhanulhakim Mohd, Yeop Majlis, Burhanuddin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187731/
https://www.ncbi.nlm.nih.gov/pubmed/30424155
http://dx.doi.org/10.3390/mi9050222

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187731/
https://www.ncbi.nlm.nih.gov/pubmed/30424155
http://dx.doi.org/10.3390/mi9050222

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