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Surface Modification of Electroosmotic Silicon Microchannel Using Thermal Dry Oxidation
A simple fabrication method for the surface modification of an electroosmotic silicon microchannel using thermal dry oxidation is presented. The surface modification is done by coating the silicon surface with a silicon dioxide (SiO(2)) layer using a thermal oxidation process. The process aims not o...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187731/ https://www.ncbi.nlm.nih.gov/pubmed/30424155 http://dx.doi.org/10.3390/mi9050222 |