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Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters
In this study, Nb(2)O(5) ceramic was used as the target to deposit the Nb(2)O(5) thin films on glass substrates with the radio frequency (RF) magnetron sputtering method. Different deposition temperatures and O(2) ratios were used as parameters to investigate the optical properties of Nb(2)O(5) thin...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6189702/ https://www.ncbi.nlm.nih.gov/pubmed/30404326 http://dx.doi.org/10.3390/mi7090151 |
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author | Chen, Kun-Neng Hsu, Chao-Ming Liu, Jing Liou, Yu-Chen Yang, Cheng-Fu |
author_facet | Chen, Kun-Neng Hsu, Chao-Ming Liu, Jing Liou, Yu-Chen Yang, Cheng-Fu |
author_sort | Chen, Kun-Neng |
collection | PubMed |
description | In this study, Nb(2)O(5) ceramic was used as the target to deposit the Nb(2)O(5) thin films on glass substrates with the radio frequency (RF) magnetron sputtering method. Different deposition temperatures and O(2) ratios were used as parameters to investigate the optical properties of Nb(2)O(5) thin films. The deposition parameters were a pressure of 5 × 10(−3) Torr, a deposition power of 100 W, a deposition time of 30 min, an O(2) ratio (O(2)/(O(2) + Ar), in sccm) of 10% and 20%, and deposition temperatures of room temperature (RT), 200, 300 and 400 °C, respectively. We found that even if the deposition temperature was 400 °C, the deposited Nb(2)O(5) thin films revealed an amorphous phase and no crystallization phase was observed. The optical properties of transmittance of Nb(2)O(5) thin films deposited on glass substrates were determined by using a ultraviolet-visible (UV-vis) spectrophotometer (transmittance) and reflectance spectra transmittance (reflectance, refractive index, and extinction coefficient) in the light wavelength range of 250–1000 nm. When the O(2) ratio was 10% and the deposition temperature increased from RT to 200 °C, the red-shift was clearly observed in the transmittance curve and the transmission ratio had no apparent change with the increasing deposition temperature. When the O(2) ratio was 20%, the red-shift was not observed in the transmittance curve and the transmission ratio apparently decreased with the increasing deposition temperature. The variations in the optical band gap (E(g)) values of Nb(2)O(5) thin films were evaluated from the Tauc plot by using the quantity hν (the photon energy) on the abscissa and the quantity (αhν)(r) on the ordinate, where α is the optical absorption coefficient, c is the constant for direct transition, h is Planck’s constant, ν is the frequency of the incident photon, and the exponent r denotes the nature of the transition. As the O(2) ratio of 10% or 20% was used as the deposition atmosphere, the measured E(g) values decreased with the increase of the deposition temperature. The reflectance ratio, extinction coefficient, and refractive index curves of Nb(2)O(5) thin films were also investigated in this study. We would show that those results were influenced by the deposition temperature and O(2) ratio. |
format | Online Article Text |
id | pubmed-6189702 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-61897022018-11-01 Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters Chen, Kun-Neng Hsu, Chao-Ming Liu, Jing Liou, Yu-Chen Yang, Cheng-Fu Micromachines (Basel) Article In this study, Nb(2)O(5) ceramic was used as the target to deposit the Nb(2)O(5) thin films on glass substrates with the radio frequency (RF) magnetron sputtering method. Different deposition temperatures and O(2) ratios were used as parameters to investigate the optical properties of Nb(2)O(5) thin films. The deposition parameters were a pressure of 5 × 10(−3) Torr, a deposition power of 100 W, a deposition time of 30 min, an O(2) ratio (O(2)/(O(2) + Ar), in sccm) of 10% and 20%, and deposition temperatures of room temperature (RT), 200, 300 and 400 °C, respectively. We found that even if the deposition temperature was 400 °C, the deposited Nb(2)O(5) thin films revealed an amorphous phase and no crystallization phase was observed. The optical properties of transmittance of Nb(2)O(5) thin films deposited on glass substrates were determined by using a ultraviolet-visible (UV-vis) spectrophotometer (transmittance) and reflectance spectra transmittance (reflectance, refractive index, and extinction coefficient) in the light wavelength range of 250–1000 nm. When the O(2) ratio was 10% and the deposition temperature increased from RT to 200 °C, the red-shift was clearly observed in the transmittance curve and the transmission ratio had no apparent change with the increasing deposition temperature. When the O(2) ratio was 20%, the red-shift was not observed in the transmittance curve and the transmission ratio apparently decreased with the increasing deposition temperature. The variations in the optical band gap (E(g)) values of Nb(2)O(5) thin films were evaluated from the Tauc plot by using the quantity hν (the photon energy) on the abscissa and the quantity (αhν)(r) on the ordinate, where α is the optical absorption coefficient, c is the constant for direct transition, h is Planck’s constant, ν is the frequency of the incident photon, and the exponent r denotes the nature of the transition. As the O(2) ratio of 10% or 20% was used as the deposition atmosphere, the measured E(g) values decreased with the increase of the deposition temperature. The reflectance ratio, extinction coefficient, and refractive index curves of Nb(2)O(5) thin films were also investigated in this study. We would show that those results were influenced by the deposition temperature and O(2) ratio. MDPI 2016-09-01 /pmc/articles/PMC6189702/ /pubmed/30404326 http://dx.doi.org/10.3390/mi7090151 Text en © 2016 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC-BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Chen, Kun-Neng Hsu, Chao-Ming Liu, Jing Liou, Yu-Chen Yang, Cheng-Fu Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters |
title | Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters |
title_full | Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters |
title_fullStr | Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters |
title_full_unstemmed | Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters |
title_short | Investigation of Antireflection Nb(2)O(5) Thin Films by the Sputtering Method under Different Deposition Parameters |
title_sort | investigation of antireflection nb(2)o(5) thin films by the sputtering method under different deposition parameters |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6189702/ https://www.ncbi.nlm.nih.gov/pubmed/30404326 http://dx.doi.org/10.3390/mi7090151 |
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