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Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching

We introduce a non-lithographical and vacuum-free method to pattern silicon. The method combines inkjet printing and metal assisted chemical etching (MaCE); we call this method “INKMAC”. A commercial silver ink is printed on top of a silicon surface to create the catalytic patterns for MaCE. The MaC...

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Autores principales: Hoshian, Sasha, Gaspar, Cristina, Vasara, Teemu, Jahangiri, Farzin, Jokinen, Ville, Franssila, Sami
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6189811/
https://www.ncbi.nlm.nih.gov/pubmed/30404394
http://dx.doi.org/10.3390/mi7120222
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author Hoshian, Sasha
Gaspar, Cristina
Vasara, Teemu
Jahangiri, Farzin
Jokinen, Ville
Franssila, Sami
author_facet Hoshian, Sasha
Gaspar, Cristina
Vasara, Teemu
Jahangiri, Farzin
Jokinen, Ville
Franssila, Sami
author_sort Hoshian, Sasha
collection PubMed
description We introduce a non-lithographical and vacuum-free method to pattern silicon. The method combines inkjet printing and metal assisted chemical etching (MaCE); we call this method “INKMAC”. A commercial silver ink is printed on top of a silicon surface to create the catalytic patterns for MaCE. The MaCE process leaves behind a set of silicon nanowires in the shape of the inkjet printed micrometer scale pattern. We further show how a potassium hydroxide (KOH) wet etching process can be used to rapidly etch away the nanowires, producing fully opened cavities and channels in the shape of the original printed pattern. We show how the printed lines (width 50–100 µm) can be etched into functional silicon microfluidic channels with different depths (10–40 µm) with aspect ratios close to one. We also used individual droplets (minimum diameter 30 µm) to produce cavities with a depth of 60 µm and an aspect ratio of two. Further, we discuss using the structured silicon substrate as a template for polymer replication to produce superhydrophobic surfaces.
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spelling pubmed-61898112018-11-01 Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching Hoshian, Sasha Gaspar, Cristina Vasara, Teemu Jahangiri, Farzin Jokinen, Ville Franssila, Sami Micromachines (Basel) Communication We introduce a non-lithographical and vacuum-free method to pattern silicon. The method combines inkjet printing and metal assisted chemical etching (MaCE); we call this method “INKMAC”. A commercial silver ink is printed on top of a silicon surface to create the catalytic patterns for MaCE. The MaCE process leaves behind a set of silicon nanowires in the shape of the inkjet printed micrometer scale pattern. We further show how a potassium hydroxide (KOH) wet etching process can be used to rapidly etch away the nanowires, producing fully opened cavities and channels in the shape of the original printed pattern. We show how the printed lines (width 50–100 µm) can be etched into functional silicon microfluidic channels with different depths (10–40 µm) with aspect ratios close to one. We also used individual droplets (minimum diameter 30 µm) to produce cavities with a depth of 60 µm and an aspect ratio of two. Further, we discuss using the structured silicon substrate as a template for polymer replication to produce superhydrophobic surfaces. MDPI 2016-12-08 /pmc/articles/PMC6189811/ /pubmed/30404394 http://dx.doi.org/10.3390/mi7120222 Text en © 2016 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC-BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Communication
Hoshian, Sasha
Gaspar, Cristina
Vasara, Teemu
Jahangiri, Farzin
Jokinen, Ville
Franssila, Sami
Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching
title Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching
title_full Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching
title_fullStr Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching
title_full_unstemmed Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching
title_short Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching
title_sort non-lithographic silicon micromachining using inkjet and chemical etching
topic Communication
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6189811/
https://www.ncbi.nlm.nih.gov/pubmed/30404394
http://dx.doi.org/10.3390/mi7120222
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