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Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective Si...

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Detalles Bibliográficos
Autores principales: Ou, Yiyu, Fadil, Ahmed, Ou, Haiyan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190085/
https://www.ncbi.nlm.nih.gov/pubmed/30404323
http://dx.doi.org/10.3390/mi7090152
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author Ou, Yiyu
Fadil, Ahmed
Ou, Haiyan
author_facet Ou, Yiyu
Fadil, Ahmed
Ou, Haiyan
author_sort Ou, Yiyu
collection PubMed
description An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices.
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spelling pubmed-61900852018-11-01 Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning Ou, Yiyu Fadil, Ahmed Ou, Haiyan Micromachines (Basel) Article An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices. MDPI 2016-09-01 /pmc/articles/PMC6190085/ /pubmed/30404323 http://dx.doi.org/10.3390/mi7090152 Text en © 2016 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC-BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Ou, Yiyu
Fadil, Ahmed
Ou, Haiyan
Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning
title Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning
title_full Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning
title_fullStr Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning
title_full_unstemmed Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning
title_short Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning
title_sort antireflective sic surface fabricated by scalable self-assembled nanopatterning
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190085/
https://www.ncbi.nlm.nih.gov/pubmed/30404323
http://dx.doi.org/10.3390/mi7090152
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