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Atomic Layer Deposition of Zinc Oxide: Study on the Water Pulse Reactions from First-Principles
[Image: see text] Atomic layer deposition (ALD) of zinc oxide thin films has been under intense research in the past few years. The most common precursors used in this process are diethyl zinc (DEZ) and water. The surface chemistry related to the growth of a zinc oxide thin film via atomic layer dep...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical
Society
2018
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6203180/ https://www.ncbi.nlm.nih.gov/pubmed/30405869 http://dx.doi.org/10.1021/acs.jpcc.7b11469 |