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Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels
A facile approach was demonstrated for fabricating high-performance nonvolatile memory devices based on ferroelectric-gate field effect transistors using a p-type Si nanowire coated with omega-shaped gate organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)). We overcame th...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer Berlin Heidelberg
2014
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6223970/ https://www.ncbi.nlm.nih.gov/pubmed/30464954 http://dx.doi.org/10.1007/s40820-014-0016-2 |
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author | Van, Ngoc Huynh Lee, Jae-Hyun Whang, Dongmok Kang, Dae Joon |
author_facet | Van, Ngoc Huynh Lee, Jae-Hyun Whang, Dongmok Kang, Dae Joon |
author_sort | Van, Ngoc Huynh |
collection | PubMed |
description | A facile approach was demonstrated for fabricating high-performance nonvolatile memory devices based on ferroelectric-gate field effect transistors using a p-type Si nanowire coated with omega-shaped gate organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)). We overcame the interfacial layer problem by incorporating P(VDF-TrFE) as a ferroelectric gate using a low-temperature fabrication process. Our memory devices exhibited excellent memory characteristics with a low programming voltage of ±5 V, a large modulation in channel conductance between ON and OFF states exceeding 10(5), a long retention time greater than 3 × 10(4) s, and a high endurance of over 10(5) programming cycles while maintaining an I(ON)/I(OFF) ratio higher than 10(2). |
format | Online Article Text |
id | pubmed-6223970 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2014 |
publisher | Springer Berlin Heidelberg |
record_format | MEDLINE/PubMed |
spelling | pubmed-62239702018-11-19 Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels Van, Ngoc Huynh Lee, Jae-Hyun Whang, Dongmok Kang, Dae Joon Nanomicro Lett Article A facile approach was demonstrated for fabricating high-performance nonvolatile memory devices based on ferroelectric-gate field effect transistors using a p-type Si nanowire coated with omega-shaped gate organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)). We overcame the interfacial layer problem by incorporating P(VDF-TrFE) as a ferroelectric gate using a low-temperature fabrication process. Our memory devices exhibited excellent memory characteristics with a low programming voltage of ±5 V, a large modulation in channel conductance between ON and OFF states exceeding 10(5), a long retention time greater than 3 × 10(4) s, and a high endurance of over 10(5) programming cycles while maintaining an I(ON)/I(OFF) ratio higher than 10(2). Springer Berlin Heidelberg 2014-10-23 /pmc/articles/PMC6223970/ /pubmed/30464954 http://dx.doi.org/10.1007/s40820-014-0016-2 Text en © The Author(s) 2014 https://creativecommons.org/licenses/by/4.0/ Open AccessThis article is distributed under the terms of the Creative Commons Attribution License which permits any use, distribution, and reproduction in any medium, provided the original author(s) and the source are credited. |
spellingShingle | Article Van, Ngoc Huynh Lee, Jae-Hyun Whang, Dongmok Kang, Dae Joon Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels |
title | Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels |
title_full | Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels |
title_fullStr | Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels |
title_full_unstemmed | Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels |
title_short | Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels |
title_sort | low-programmable-voltage nonvolatile memory devices based on omega-shaped gate organic ferroelectric p(vdf-trfe) field effect transistors using p-type silicon nanowire channels |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6223970/ https://www.ncbi.nlm.nih.gov/pubmed/30464954 http://dx.doi.org/10.1007/s40820-014-0016-2 |
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