Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

We demonstrate extension of electron-beam lithography using conventional resists and pattern transfer processes to single-digit nanometer dimensions by employing an aberration-corrected scanning transmission electron microscope as the exposure tool. Here, we present results of single-digit nanometer...

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Detalles Bibliográficos
Autores principales: Camino, Fernando E., Manfrinato, Vitor R., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., Black, Charles T.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MyJove Corporation 2018
Materias:
Engineering
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6235187/
https://www.ncbi.nlm.nih.gov/pubmed/30272655
http://dx.doi.org/10.3791/58272

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6235187/
https://www.ncbi.nlm.nih.gov/pubmed/30272655
http://dx.doi.org/10.3791/58272

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