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Study of dosimetric properties of flattened and unflattened megavoltage x ray beam on high Z implant materials

PURPOSE: Addition of high Z implants in the treatment vicinity or beam path is unavoidable in certain clinical situation. In this work, we study the properties of radiation interaction parameters such as mass attenuation coefficient (MAC), x ray beam transmission factor (indirect beam attenuation),...

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Detalles Bibliográficos
Autores principales: Rajamanickam, Tamilarasan, Muthu, Sivakumar, Murugan, Perumal, Pathokonda, Muddappa, Senthilnathan, Krishnamoorthy, Arunai Nambi Raj, Narayanasamy, Ramesh Babu, Padmanabhan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6236858/
https://www.ncbi.nlm.nih.gov/pubmed/30267468
http://dx.doi.org/10.1002/acm2.12451