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Study of dosimetric properties of flattened and unflattened megavoltage x ray beam on high Z implant materials
PURPOSE: Addition of high Z implants in the treatment vicinity or beam path is unavoidable in certain clinical situation. In this work, we study the properties of radiation interaction parameters such as mass attenuation coefficient (MAC), x ray beam transmission factor (indirect beam attenuation),...
Autores principales: | Rajamanickam, Tamilarasan, Muthu, Sivakumar, Murugan, Perumal, Pathokonda, Muddappa, Senthilnathan, Krishnamoorthy, Arunai Nambi Raj, Narayanasamy, Ramesh Babu, Padmanabhan |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
John Wiley and Sons Inc.
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6236858/ https://www.ncbi.nlm.nih.gov/pubmed/30267468 http://dx.doi.org/10.1002/acm2.12451 |
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