Author Correction: Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures

Detalles Bibliográficos
Autores principales: Son, Jangyup, Kwon, Junyoung, Kim, SunPhil, Lv, Yinchuan, Yu, Jaehyung, Lee, Jong-Young, Ryu, Huije, Watanabe, Kenji, Taniguchi, Takashi, Garrido-Menacho, Rita, Mason, Nadya, Ertekin, Elif, Huang, Pinshane Y., Lee, Gwan-Hyoung, van der Zande, Arend M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Author Correction
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6244009/
https://www.ncbi.nlm.nih.gov/pubmed/30459307
http://dx.doi.org/10.1038/s41467-018-07297-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6244009/
https://www.ncbi.nlm.nih.gov/pubmed/30459307
http://dx.doi.org/10.1038/s41467-018-07297-5

Ejemplares similares