One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based...

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Detalles Bibliográficos
Autores principales: Tan, Xianhua, Shi, Tielin, Lin, Jianbin, Sun, Bo, Tang, Zirong, Liao, Guanglan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2018
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6281547/
https://www.ncbi.nlm.nih.gov/pubmed/30519820
http://dx.doi.org/10.1186/s11671-018-2817-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6281547/
https://www.ncbi.nlm.nih.gov/pubmed/30519820
http://dx.doi.org/10.1186/s11671-018-2817-6

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