One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based...

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Detalles Bibliográficos
Autores principales: Tan, Xianhua, Shi, Tielin, Lin, Jianbin, Sun, Bo, Tang, Zirong, Liao, Guanglan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2018
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6281547/
https://www.ncbi.nlm.nih.gov/pubmed/30519820
http://dx.doi.org/10.1186/s11671-018-2817-6
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author Tan, Xianhua
Shi, Tielin
Lin, Jianbin
Sun, Bo
Tang, Zirong
Liao, Guanglan
author_facet Tan, Xianhua
Shi, Tielin
Lin, Jianbin
Sun, Bo
Tang, Zirong
Liao, Guanglan
author_sort Tan, Xianhua
collection PubMed
description We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices.
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spelling pubmed-62815472018-12-26 One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures Tan, Xianhua Shi, Tielin Lin, Jianbin Sun, Bo Tang, Zirong Liao, Guanglan Nanoscale Res Lett Nano Express We propose a novel one-step exposure method for fabricating three-dimensional (3D) suspended structures, utilizing the diffraction of mask patterns with small line width. An optical model of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based on Fresnel-Kirchhoff diffraction formulation. Several 3D suspended photoresist structures have been achieved, such as beams, meshes, word patterns, and multilayer structures. After the pyrolysis of SU-8 structures, suspended and free-standing 3D carbon structures are further obtained, which show great potential in the application of transparent electrode, semitransparent solar cells, and energy storage devices. Springer US 2018-12-05 /pmc/articles/PMC6281547/ /pubmed/30519820 http://dx.doi.org/10.1186/s11671-018-2817-6 Text en © The Author(s). 2018 Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
spellingShingle Nano Express
Tan, Xianhua
Shi, Tielin
Lin, Jianbin
Sun, Bo
Tang, Zirong
Liao, Guanglan
One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
title One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
title_full One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
title_fullStr One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
title_full_unstemmed One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
title_short One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures
title_sort one-step mask-based diffraction lithography for the fabrication of 3d suspended structures
topic Nano Express
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6281547/
https://www.ncbi.nlm.nih.gov/pubmed/30519820
http://dx.doi.org/10.1186/s11671-018-2817-6
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