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Particle atomic layer deposition
The functionalization of fine primary particles by atomic layer deposition (particle ALD) provides for nearly perfect nanothick films to be deposited conformally on both external and internal particle surfaces, including nanoparticle surfaces. Film thickness is easily controlled from several angstro...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Springer Netherlands
2019
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6320374/ https://www.ncbi.nlm.nih.gov/pubmed/30662321 http://dx.doi.org/10.1007/s11051-018-4442-9 |