Sputtering of silicon nanopowders by an argon cluster ion beam

In this work an Ar(+) cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 10(14)–2.3 × 10(16) cluster/cm(2) was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam par...

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Detalles Bibliográficos
Autores principales: Zeng, Xiaomei, Pelenovich, Vasiliy, Wang, Zhenguo, Zuo, Wenbin, Belykh, Sergey, Tolstogouzov, Alexander, Fu, Dejun, Xiao, Xiangheng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2019
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6334788/
https://www.ncbi.nlm.nih.gov/pubmed/30680286
http://dx.doi.org/10.3762/bjnano.10.13

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6334788/
https://www.ncbi.nlm.nih.gov/pubmed/30680286
http://dx.doi.org/10.3762/bjnano.10.13

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