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Sputtering of silicon nanopowders by an argon cluster ion beam

In this work an Ar(+) cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 10(14)–2.3 × 10(16) cluster/cm(2) was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam par...

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Autores principales: Zeng, Xiaomei, Pelenovich, Vasiliy, Wang, Zhenguo, Zuo, Wenbin, Belykh, Sergey, Tolstogouzov, Alexander, Fu, Dejun, Xiao, Xiangheng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6334788/
https://www.ncbi.nlm.nih.gov/pubmed/30680286
http://dx.doi.org/10.3762/bjnano.10.13
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author Zeng, Xiaomei
Pelenovich, Vasiliy
Wang, Zhenguo
Zuo, Wenbin
Belykh, Sergey
Tolstogouzov, Alexander
Fu, Dejun
Xiao, Xiangheng
author_facet Zeng, Xiaomei
Pelenovich, Vasiliy
Wang, Zhenguo
Zuo, Wenbin
Belykh, Sergey
Tolstogouzov, Alexander
Fu, Dejun
Xiao, Xiangheng
author_sort Zeng, Xiaomei
collection PubMed
description In this work an Ar(+) cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 10(14)–2.3 × 10(16) cluster/cm(2) was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters (energy and dose) on the sputtering depth and sputtering yield was studied. The sputtering yield was found to decrease with increasing dose and target density. The energy dependence demonstrated an unusual non-monotonic behavior. At 17.3 keV a maximum of the sputtering yield was observed, which was more than forty times higher than that of the bulk Si. The surface roughness at low energy demonstrates a similar energy dependence with a maximum near 17 keV. The dose and energy dependence of the sputtering yield was explained by the competition of the finite size effect and the effect of debris formation.
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spelling pubmed-63347882019-01-24 Sputtering of silicon nanopowders by an argon cluster ion beam Zeng, Xiaomei Pelenovich, Vasiliy Wang, Zhenguo Zuo, Wenbin Belykh, Sergey Tolstogouzov, Alexander Fu, Dejun Xiao, Xiangheng Beilstein J Nanotechnol Full Research Paper In this work an Ar(+) cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 10(14)–2.3 × 10(16) cluster/cm(2) was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters (energy and dose) on the sputtering depth and sputtering yield was studied. The sputtering yield was found to decrease with increasing dose and target density. The energy dependence demonstrated an unusual non-monotonic behavior. At 17.3 keV a maximum of the sputtering yield was observed, which was more than forty times higher than that of the bulk Si. The surface roughness at low energy demonstrates a similar energy dependence with a maximum near 17 keV. The dose and energy dependence of the sputtering yield was explained by the competition of the finite size effect and the effect of debris formation. Beilstein-Institut 2019-01-10 /pmc/articles/PMC6334788/ /pubmed/30680286 http://dx.doi.org/10.3762/bjnano.10.13 Text en Copyright © 2019, Zeng et al. https://creativecommons.org/licenses/by/4.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0). Please note that the reuse, redistribution and reproduction in particular requires that the authors and source are credited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)
spellingShingle Full Research Paper
Zeng, Xiaomei
Pelenovich, Vasiliy
Wang, Zhenguo
Zuo, Wenbin
Belykh, Sergey
Tolstogouzov, Alexander
Fu, Dejun
Xiao, Xiangheng
Sputtering of silicon nanopowders by an argon cluster ion beam
title Sputtering of silicon nanopowders by an argon cluster ion beam
title_full Sputtering of silicon nanopowders by an argon cluster ion beam
title_fullStr Sputtering of silicon nanopowders by an argon cluster ion beam
title_full_unstemmed Sputtering of silicon nanopowders by an argon cluster ion beam
title_short Sputtering of silicon nanopowders by an argon cluster ion beam
title_sort sputtering of silicon nanopowders by an argon cluster ion beam
topic Full Research Paper
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6334788/
https://www.ncbi.nlm.nih.gov/pubmed/30680286
http://dx.doi.org/10.3762/bjnano.10.13
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