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Sputtering of silicon nanopowders by an argon cluster ion beam
In this work an Ar(+) cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 10(14)–2.3 × 10(16) cluster/cm(2) was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam par...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6334788/ https://www.ncbi.nlm.nih.gov/pubmed/30680286 http://dx.doi.org/10.3762/bjnano.10.13 |