Comparing the Through-Thickness Gradient of the Deformed and Recrystallized Microstructure in Tantalum with Unidirectional and Clock Rolling

Controlling the microstructure homogeneity is crucial in achieving high quality tantalum (Ta) sputtering targets used in integrated circuit fabrication. Unluckily, traditional rolling easily generates a microstructure gradient along the thickness direction in Ta sheets. The deformation and recrystal...

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Detalles Bibliográficos
Autores principales: Zhu, Jialin, Liu, Shifeng, Yuan, Xiaoli, Liu, Qing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6337748/
https://www.ncbi.nlm.nih.gov/pubmed/30621074
http://dx.doi.org/10.3390/ma12010169

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6337748/
https://www.ncbi.nlm.nih.gov/pubmed/30621074
http://dx.doi.org/10.3390/ma12010169

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