Advanced measurement and diagnosis of the effect on the underlayer roughness for industrial standard metrology

In current nanoscale semiconductor fabrications, high dielectric materials and ultrathin multilayers have been selected to improve the performance of the devices. Thus, interface effects between films and the quantification of surface information are becoming key issues for determining the performan...

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Detalles Bibliográficos
Autores principales: Kim, Jung-Hwan, Moon, Seunghyun, Kim, Ji-Woong, Lee, Donggun, Park, Byong Chon, Kim, Dal-Hyun, Jeong, Yoojin, Hand, Sean, Osborne, Jason, De Wolf, Peter, Kim, Youn Sang, Shin, ChaeHo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6355768/
https://www.ncbi.nlm.nih.gov/pubmed/30705294
http://dx.doi.org/10.1038/s41598-018-36991-z

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6355768/
https://www.ncbi.nlm.nih.gov/pubmed/30705294
http://dx.doi.org/10.1038/s41598-018-36991-z

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