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Advanced measurement and diagnosis of the effect on the underlayer roughness for industrial standard metrology
In current nanoscale semiconductor fabrications, high dielectric materials and ultrathin multilayers have been selected to improve the performance of the devices. Thus, interface effects between films and the quantification of surface information are becoming key issues for determining the performan...
| Autores principales: | , , , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6355768/ https://www.ncbi.nlm.nih.gov/pubmed/30705294 http://dx.doi.org/10.1038/s41598-018-36991-z |