Tin, The Enabler—Hydrogen Diffusion into Ruthenium

Hydrogen interaction with ruthenium is of particular importance for the ruthenium-capped multilayer reflectors used in extreme ultraviolet (EUV) lithography. Hydrogen causes blistering, which leads to a loss of reflectivity. This problem is aggravated by tin. This study aims to uncover the mechanism...

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Detalles Bibliográficos
Autores principales: Onwudinanti, Chidozie, Tranca, Ionuţ, Morgan, Thomas, Tao, Shuxia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6359073/
https://www.ncbi.nlm.nih.gov/pubmed/30669594
http://dx.doi.org/10.3390/nano9010129

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6359073/
https://www.ncbi.nlm.nih.gov/pubmed/30669594
http://dx.doi.org/10.3390/nano9010129

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