Systematic Study of the SiO(x) Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO(x)/SiO(2) Super-Lattice

Atomic scale control of the thickness of thin film makes atomic layer deposition highly advantageous in the preparation of high quality super-lattices. However, precisely controlling the film chemical stoichiometry is very challenging. In this study, we deposited SiO(x) film with different stoichiom...

Descripción completa

Detalles Bibliográficos
Autores principales: Ma, Hong-Ping, Yang, Jia-He, Yang, Jian-Guo, Zhu, Li-Yuan, Huang, Wei, Yuan, Guang-Jie, Feng, Ji-Jun, Jen, Tien-Chien, Lu, Hong-Liang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6359230/
https://www.ncbi.nlm.nih.gov/pubmed/30609822
http://dx.doi.org/10.3390/nano9010055

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6359230/
https://www.ncbi.nlm.nih.gov/pubmed/30609822
http://dx.doi.org/10.3390/nano9010055

Ejemplares similares