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From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity†
[Image: see text] Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently gaining momentum in semiconductor processing, because of the increasing need for eliminating the edge placement errors of top-down processing. Moreover, area-selective ALD offers new opportunitie...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American Chemical
Society
2018
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6369656/ https://www.ncbi.nlm.nih.gov/pubmed/30774194 http://dx.doi.org/10.1021/acs.chemmater.8b03454 |