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From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity†

[Image: see text] Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently gaining momentum in semiconductor processing, because of the increasing need for eliminating the edge placement errors of top-down processing. Moreover, area-selective ALD offers new opportunitie...

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Detalles Bibliográficos
Autores principales:	Mackus, Adriaan J. M., Merkx, Marc J. M., Kessels, Wilhelmus M. M.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	American Chemical Society 2018
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6369656/ https://www.ncbi.nlm.nih.gov/pubmed/30774194 http://dx.doi.org/10.1021/acs.chemmater.8b03454

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