Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition

[Image: see text] The ability to deposit thin and conformal films has become of great importance because of downscaling of devices. However, because of nucleation difficulty, depositing an electrically stable and thin conformal platinum film on an oxide nucleation layer has proven challenging. By us...

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Detalles Bibliográficos
Autores principales: Kim, Hyo Jin K., Kaplan, Kirsten E., Schindler, Peter, Xu, Shicheng, Winterkorn, Martin M., Heinz, David B., English, Timothy S., Provine, J., Prinz, Fritz B., Kenny, Thomas W.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2019
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6407042/
https://www.ncbi.nlm.nih.gov/pubmed/30707831
http://dx.doi.org/10.1021/acsami.8b21054

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6407042/
https://www.ncbi.nlm.nih.gov/pubmed/30707831
http://dx.doi.org/10.1021/acsami.8b21054

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