Cargando…
An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer
Thin films are a type of coating that have a very wide spectrum of applications. They may be used as single layers or composed in multilayer stacks, which significantly extend their applications. One of the most commonly used material for thin films is silicon dioxide, SiO(2). Although there are oth...
Autores principales: | , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6412209/ https://www.ncbi.nlm.nih.gov/pubmed/30795504 http://dx.doi.org/10.3390/s19040892 |
_version_ | 1783402552093573120 |
---|---|
author | Zarzycki, Artur Galeano, July Bargiel, Sylwester Andrieux, Aurore Gorecki, Christophe |
author_facet | Zarzycki, Artur Galeano, July Bargiel, Sylwester Andrieux, Aurore Gorecki, Christophe |
author_sort | Zarzycki, Artur |
collection | PubMed |
description | Thin films are a type of coating that have a very wide spectrum of applications. They may be used as single layers or composed in multilayer stacks, which significantly extend their applications. One of the most commonly used material for thin films is silicon dioxide, SiO(2). Although there are other tools that can be used to measure the thickness of SiO(2) films, these tools are very complex and sophisticated. In this article, we propose the use of an exponential two-layer light-material interaction model, throughout its diffuse reflectance spectra, as an alternative for the measurement of the thickness of evaporated SiO(2) on Si wafers. The proposed model is evaluated experimentally by means of a 980-nm-thick SiO(2) layer evaporated on a Si wafer. The results show that the proposed model has a strong correlation with the thickness measurements obtained using commercial equipment. |
format | Online Article Text |
id | pubmed-6412209 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-64122092019-04-03 An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer Zarzycki, Artur Galeano, July Bargiel, Sylwester Andrieux, Aurore Gorecki, Christophe Sensors (Basel) Article Thin films are a type of coating that have a very wide spectrum of applications. They may be used as single layers or composed in multilayer stacks, which significantly extend their applications. One of the most commonly used material for thin films is silicon dioxide, SiO(2). Although there are other tools that can be used to measure the thickness of SiO(2) films, these tools are very complex and sophisticated. In this article, we propose the use of an exponential two-layer light-material interaction model, throughout its diffuse reflectance spectra, as an alternative for the measurement of the thickness of evaporated SiO(2) on Si wafers. The proposed model is evaluated experimentally by means of a 980-nm-thick SiO(2) layer evaporated on a Si wafer. The results show that the proposed model has a strong correlation with the thickness measurements obtained using commercial equipment. MDPI 2019-02-21 /pmc/articles/PMC6412209/ /pubmed/30795504 http://dx.doi.org/10.3390/s19040892 Text en © 2019 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Zarzycki, Artur Galeano, July Bargiel, Sylwester Andrieux, Aurore Gorecki, Christophe An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer |
title | An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer |
title_full | An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer |
title_fullStr | An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer |
title_full_unstemmed | An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer |
title_short | An Optical Diffuse Reflectance Model for the Characterization of a Si Wafer with an Evaporated SiO(2) Layer |
title_sort | optical diffuse reflectance model for the characterization of a si wafer with an evaporated sio(2) layer |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6412209/ https://www.ncbi.nlm.nih.gov/pubmed/30795504 http://dx.doi.org/10.3390/s19040892 |
work_keys_str_mv | AT zarzyckiartur anopticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT galeanojuly anopticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT bargielsylwester anopticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT andrieuxaurore anopticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT goreckichristophe anopticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT zarzyckiartur opticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT galeanojuly opticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT bargielsylwester opticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT andrieuxaurore opticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer AT goreckichristophe opticaldiffusereflectancemodelforthecharacterizationofasiwaferwithanevaporatedsio2layer |