Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH

Squares and circles are basic patterns for most mask designs of silicon microdevices. Evolution of etched Si crystallographic planes defined by square and circle patterns in the masking layer is presented and analyzed in this paper. The sides of square patterns in the masking layer are designed alon...

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Detalles Bibliográficos
Autores principales: Smiljanić, Milče M., Lazić, Žarko, Radjenović, Branislav, Radmilović-Radjenović, Marija, Jović, Vesna
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6412402/
https://www.ncbi.nlm.nih.gov/pubmed/30708946
http://dx.doi.org/10.3390/mi10020102

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6412402/
https://www.ncbi.nlm.nih.gov/pubmed/30708946
http://dx.doi.org/10.3390/mi10020102

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