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Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH
Squares and circles are basic patterns for most mask designs of silicon microdevices. Evolution of etched Si crystallographic planes defined by square and circle patterns in the masking layer is presented and analyzed in this paper. The sides of square patterns in the masking layer are designed alon...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6412402/ https://www.ncbi.nlm.nih.gov/pubmed/30708946 http://dx.doi.org/10.3390/mi10020102 |