Investigation of the Corrosion Behavior of Atomic Layer Deposited Al(2)O(3)/TiO(2) Nanolaminate Thin Films on Copper in 0.1 M NaCl

Fifty nanometers of Al(2)O(3) and TiO(2) nanolaminate thin films deposited by atomic layer deposition (ALD) were investigated for protection of copper in 0.1 M NaCl using electrochemical techniques. Coated samples showed increases in polarization resistance over uncoated copper, up to 12 MΩ-cm(2)(,)...

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Detalles Bibliográficos
Autores principales: Fusco, Michael A., Oldham, Christopher J., Parsons, Gregory N.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6416637/
https://www.ncbi.nlm.nih.gov/pubmed/30813487
http://dx.doi.org/10.3390/ma12040672

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6416637/
https://www.ncbi.nlm.nih.gov/pubmed/30813487
http://dx.doi.org/10.3390/ma12040672

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