Stability Analysis of Multi Process Parameters for Metal-Organic Chemical Vapor Deposition Reaction Cavity

The parameters for metal-organic chemical vapor deposition (MOCVD) processes significantly influence the properties of ZnO films, especially the flow stability of the chamber, which is caused by process parameters such as the shape of reaction chamber, the working pressure, the growth temperature, t...

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Detalles Bibliográficos
Autores principales: Li, Jian, Wu, Ziling, Xu, Yifeng, Pei, Yanli, Wang, Gang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6429165/
https://www.ncbi.nlm.nih.gov/pubmed/30832241
http://dx.doi.org/10.3390/molecules24050876

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6429165/
https://www.ncbi.nlm.nih.gov/pubmed/30832241
http://dx.doi.org/10.3390/molecules24050876

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