Volume Hologram Formation in SU-8 Photoresist

In order to further understand the mechanism of volume hologram formation in photosensitive polymers, light-induced material response is analyzed in commonly used epoxy-based negative photoresist Epon SU-8. For this purpose, time-resolved investigation of volume holographic grating growth is perform...

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Detalles Bibliográficos
Autor principal: Sabel, Tina
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6432160/
https://www.ncbi.nlm.nih.gov/pubmed/30970876
http://dx.doi.org/10.3390/polym9060198

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6432160/
https://www.ncbi.nlm.nih.gov/pubmed/30970876
http://dx.doi.org/10.3390/polym9060198

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