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Volume Hologram Formation in SU-8 Photoresist
In order to further understand the mechanism of volume hologram formation in photosensitive polymers, light-induced material response is analyzed in commonly used epoxy-based negative photoresist Epon SU-8. For this purpose, time-resolved investigation of volume holographic grating growth is perform...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6432160/ https://www.ncbi.nlm.nih.gov/pubmed/30970876 http://dx.doi.org/10.3390/polym9060198 |