Scalable fabrication of microneedle arrays via spatially controlled UV exposure

This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create micr...

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Detalles Bibliográficos
Autores principales: Takahashi, Hidetoshi, Jung Heo, Yun, Arakawa, Nobuchika, Kan, Tesuo, Matsumoto, Kiyoshi, Kawano, Ryuji, Shimoyama, Isao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6444715/
https://www.ncbi.nlm.nih.gov/pubmed/31057837
http://dx.doi.org/10.1038/micronano.2016.49

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6444715/
https://www.ncbi.nlm.nih.gov/pubmed/31057837
http://dx.doi.org/10.1038/micronano.2016.49

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